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" ... Intel’s misstarts with its 10nm process node and 7nm delay announcement have been a thorn in its side, so I was glad to see the company immediately get out ahead of it for Architecture Day. The good news is, its latest 10nm process and devices built on it are significantly enhanced by refinements across its entire fab process stack and the base transistor technology that it’s built upon. Intel’s 10nm SuperFin (short for Super FinFET) employ a new super metal insulator metal capacitor, or Super MIM (lots of Super going on), that offers a 5X increase in capacitance and resistance reduction of 30 percent. This results in lower leakage current and better overall power characteristics across the voltage curve. Along with a higher gate pitch, the sum total of these enhancements allows SuperFIN transistors to handle higher drive current as well. However, it’s what Intel has achieved with SuperFin that its customers will care most about. ... "