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" ... Getzien was featured in the 1888 Allen & Ginter set, which had beautiful color lithography. His... [+] name's spelling has different variations, but Getzien seems the most accurate. ... "
" ... On lithography beyond the 1-beta node EUV can provide a cost reduction opportunity (less steps and complexity required). Lower cell capacitance requires lower drive but loses sense margin, perhaps requiring more frequent refreshes and greater possible wordline disturbs. These are just a few of the technical issues that have slowed the capacity density growth of mainstream DRAM technology. Following is the summary from her talk: cost may be beneficial beyond 1-beta node, longer word-lines and bit-line to maximize array efficiency saturation with array scaling is a challenge, more aggressive CMOS and interconnect scaling needed as cell shrink slows down, process and tool advances require every node to extend scaling path and process design points and uniformity control are critical to enable process margins. ... "
" ... The above tells us two things. Firstly, that Intel's new processors are likely to be faster in single-threaded and lightly-threaded applications than AMD's latest Ryzen CPUs. This is significant as it means that the work Intel has done to include an improved architecture as well as slightly higher frequencies has had a noticeable impact. The Rocket Lake-S CPUs you can see at the top of the chart - the Core i9-11900K and Core i7-11700K - aren't just a frequency boost. They sport a new architecture and that's significant. Intel is still using a 14nm manufacturing process here, but improvements in performance can come from areas other than lithography and frequency. ... "
" ... Tired of losing battery power to get speedy apps on your mobile device, or saving power at the expense of app speed? Taiwan Semiconductor Manufacturing has a solution—a next generation chip-making technology called 7-nanometer extreme ultraviolet lithography. ... "